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B.Y. van der Wel MSc (Bernhard)

PhD Candidate

Expertise

Engineering & Materials Science
Fabrication
Nanoelectronics
Nanofluidics
Nanowires
Silicon
Physics & Astronomy
Fabrication
Silicon
Wafers

Research

Atomic layer deposition (ALD) is a thin-film deposition technique widely used in the semiconductor industry to deposit very thin layers of materials with high uniformity and high conformality. Currently several techniques have been developed and a great variety of materials can be deposited, however for many materials an ALD recipe remains unchartered. In our research the aim is to develop new recipes and use novel techniques to facilitate the ALD of these materials.

 

UT Research Information System

Affiliated Study Programmes

Bachelor

Courses Academic Year  2020/2021

Contact Details

Visiting Address

University of Twente
Drienerlolaan 5
7522 NB Enschede
The Netherlands

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Mailing Address

University of Twente
P.O. Box 217
7500 AE Enschede
The Netherlands