Carré

A.A.I. Aarnink (Tom)

Senior Process Engineer
EEMCS-EE-IDS
Carré C2615
a.a.i.aarnink@utwente.nl
+31534895912
Business card

Expertise

  • Material Science

    • Tungsten
    • Temperature
    • Electrical Resistivity
    • Aluminum Nitride
    • Thin Films
    • Surface

  • Chemistry

    • Liquid Film
    • Atomic Layer Epitaxy

Organisations

Publications

2024
Electrical behavior of ALD-molybdenum films in the thin-film limitIn 2024 IEEE 36th International Conference on Microelectronic Test Structures, ICMTS 2024 - Proceedings. IEEE. Van Der Zouw, K., Dulfer, S. D., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1109/ICMTS59902.2024.10520676
2023
Low-resistivity molybdenum obtained by atomic layer deposition, Article 052402. van der Zouw, K., van der Wel, B. Y., Aarnink, A. A. I., Wolters, R. A. M., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0002804Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride, 17134-17145. van der Wel, B. Y., van der Zouw, K., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.3c03063Thin-film (Al)BCN materials synthesized by sequential precursor pulses to mimic atomic layer deposition, Article 025237. Apaydin, R. O., Aarnink, A. A. I., Gravesteijn, D. J., De Jong, M. P. & Kovalgin, A. Y.https://doi.org/10.1063/6.0002331
2021
PureB diode fabrication using physical or chemical vapor deposition methods for increased back-end-of-line accessibility, Article 107938. Thammaiah, S. D., Liu, X., Knežević, T., Batenburg, K. M., Aarnink, A. A. I. & Nanver, L. K.https://doi.org/10.1016/j.sse.2020.107938
2020
Study of the phase nature of boron- and nitrogen-containing films by optical and photoelectron spectroscopy, Article 044009. Onnink, A. J., Apaydin, R. O., Aarnink, A. A. I., de Jong, M. P., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0000193Method of forming a device structure using selective deposition of gallium nitride and system for same. Banerjee, S., Aarnink, A. & Kovalgin, A.https://www.freepatentsonline.com/y2020/0194253.htmlConduction and electric field effect in ultra-thin tungsten films, Article 9016070, 202-209. van der Zouw, K., Aarnink, A. A. I., Schmitz, J. & Kovalgin, A. Y.https://doi.org/10.1109/TSM.2020.2976886Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia, Article 033411. Apaydin, R. O., Onnink, A. J., Liu, X., Aarnink, A. A. I., de Jong, M. P., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0000132
2019
Thermal Atomic Layer Deposition of Polycrystalline Gallium Nitride, 23214-23225. Banerjee, S., Aarnink, A. A. I., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.9b05946

Research profiles

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