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A.A.I. Aarnink (Tom)

Senior Process Engineer

Expertise

Plasmas
Temperature
Atomic Layer Deposition
Atomic Layer Epitaxy
Oxidation
Hydrogen
Temperature
Electrons

Publications

Recent Articles
Van Hao, B., Wiggers, F. B., Aarnink, A. A. I., Nguyen, D. M., de Jong, M. P., Kovalgin, A. Y., & Gupta, A. Y. (2014). Growth characteristics, optical properties, and crystallinity of thermal and plasma-enhanced ALD AlN films. In Proceeding of the 14th International Conference on Atomic Layer Deposition (pp. 113-113). Japan: ALD 2014.

UT Research Information System

Contact Details

Visiting Address

University of Twente
Faculty of Electrical Engineering, Mathematics & Computer Science
Carré (building no. 15), room 2615
Hallenweg 23
7522NH  Enschede
The Netherlands

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Mailing Address

University of Twente
Faculty of Electrical Engineering, Mathematics & Computer Science
Carré  2615
P.O. Box 217
7500 AE Enschede
The Netherlands