I joined XUV Optics in 2017 as a PhD student and in 2022 I defended my thesis on the topic "Fracture behavior and characterization of free-standing metal silicide thin films". After obtaining PhD, I stayed at XUV as a postdoc to study interaction of surfaces with plasma under supervision of Marcelo Ackermann and Marko Sturm.
Expertise
Material Science
- Thin Films
- Membrane
- Fracture Toughness
- Silicon Nitride
- Transmission Electron Microscopy
- Mechanical Strength
- Metal
- Silicide
Organisations
Publications
2025
TEM observations of plasma - thin film interaction (2025)[Contribution to conference › Poster] NWO Physics 2025. Gerlach, L., Shafikov, A., Tsvetanova, M., Sturm, J. M. & Ackermann, M.
2024
TEM observations of plasma - thin film interaction (2024)[Contribution to conference › Poster] MESA+ Day 2024. Gerlach, L., Shafikov, A., Sturm, J. M. & Ackermann, M.
2022
Fracture behavior and characterization of free-standing metal silicide thin films (2022)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Shafikov, A.https://doi.org/10.3990/1.9789036554251Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranes (2022)Intermetallics, 144. Article 107531. Shafikov, A., van de Kruijs, R. W. E., Benschop, J. P. H., Schurink, B., van den Beld, W. T. E., Houweling, Z. S., Kooi, B. J., Ahmadi, M., de Graaf, S. & Bijkerk, F.https://doi.org/10.1016/j.intermet.2022.107531Fracture Toughness of Free-Standing ZrSiₓ Thin Films Measured Using Crack-on-a-Chip Method (2022)Journal of microelectromechanical systems, 31(1), 63-73. Shafikov, A., van de Kruijs, R. W. E., Benschop, J. P. H., van den Beld, W., Houweling, S. & Bijkerk, F.https://doi.org/10.1109/JMEMS.2021.3128760
2021
Strengthening ultrathin Si3N4 membranes by compressive surface stress (2021)Sensors and Actuators A: Physical, 317. Article 112456. Shafikov, A., Schurink, B., van de Kruijs, R. W. E., Benschop, J. P. H., van den Beld, W., Houweling, S. & Bijkerk, F.https://doi.org/10.1016/j.sna.2020.112456
2020
Pellicle for EUV lithograpy (2020)[Patent › Patent]. Shafikov, A., Bijkerk, F., Schurink, B., Sturm, M. & van de Kruijs, R. W. E.
Research profiles
Address
University of Twente
Carré (building no. 15), room C2031
Hallenweg 23
7522 NH Enschede
Netherlands
University of Twente
Carré C2031
P.O. Box 217
7500 AE Enschede
Netherlands
Organisations
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