I joined XUV Optics in 2017 as a PhD student and in 2022 I defended my thesis on the topic "Fracture behavior and characterization of free-standing metal silicide thin films". After obtaining PhD, I stayed at XUV as a postdoc to study interaction of surfaces with plasma under supervision of Marcelo Ackermann and Marko Sturm.

Expertise

  • Material Science

    • Thin Films
    • Membrane
    • Fracture Toughness
    • Silicon Nitride
    • Transmission Electron Microscopy
    • Mechanical Strength
    • Metal
    • Silicide

Organisations

Publications

2025

TEM observations of plasma - thin film interaction (2025)[Contribution to conference › Poster] NWO Physics 2025. Gerlach, L., Shafikov, A., Tsvetanova, M., Sturm, J. M. & Ackermann, M.

2024

TEM observations of plasma - thin film interaction (2024)[Contribution to conference › Poster] MESA+ Day 2024. Gerlach, L., Shafikov, A., Sturm, J. M. & Ackermann, M.

2022

Fracture behavior and characterization of free-standing metal silicide thin films (2022)[Thesis › PhD Thesis - Research UT, graduation UT]. University of Twente. Shafikov, A.https://doi.org/10.3990/1.9789036554251Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranes (2022)Intermetallics, 144. Article 107531. Shafikov, A., van de Kruijs, R. W. E., Benschop, J. P. H., Schurink, B., van den Beld, W. T. E., Houweling, Z. S., Kooi, B. J., Ahmadi, M., de Graaf, S. & Bijkerk, F.https://doi.org/10.1016/j.intermet.2022.107531Fracture Toughness of Free-Standing ZrSiₓ Thin Films Measured Using Crack-on-a-Chip Method (2022)Journal of microelectromechanical systems, 31(1), 63-73. Shafikov, A., van de Kruijs, R. W. E., Benschop, J. P. H., van den Beld, W., Houweling, S. & Bijkerk, F.https://doi.org/10.1109/JMEMS.2021.3128760

2021

Strengthening ultrathin Si3N4 membranes by compressive surface stress (2021)Sensors and Actuators A: Physical, 317. Article 112456. Shafikov, A., Schurink, B., van de Kruijs, R. W. E., Benschop, J. P. H., van den Beld, W., Houweling, S. & Bijkerk, F.https://doi.org/10.1016/j.sna.2020.112456

2020

Pellicle for EUV lithograpy (2020)[Patent › Patent]. Shafikov, A., Bijkerk, F., Schurink, B., Sturm, M. & van de Kruijs, R. W. E.

Research profiles

Address

University of Twente

Carré (building no. 15), room C2031
Hallenweg 23
7522 NH Enschede
Netherlands

Navigate to location

Organisations

Scan the QR code or
Download vCard