Expertise
Material Science
- Anisotropic Etching
- Silicon
- Silicon Nitride
- Density
- Dry Etching
- Nanodevices
- Oxidation Reaction
- Lithography
Organisations
Publications
2024
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning (2024)Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics, 42(6). Article 062805. Pordeli, Y., Steenge, C., Berenschot, E. J. W., Hueting, R. J. E., Migliorini, A., Parkin, S. S. P. & Tas, N. R.https://doi.org/10.1116/6.0004024
2023
Self-aligned fabrication of nanomechanical and nanoelectronic devices by convex corner lithography on silicon wedges (2023)[Contribution to conference › Paper] 8th International Workshop on Nanotechnology and Application, IWNA 2023. Steenge, C., Kooijman, L., van Kampen, C., Borgelink, B., Janssens, Y., Pordeli, Y., Tiggelaar, R., Berenschot, E. & Tas, N.
Research profiles
Address
University of Twente
Carré (building no. 15), room C1510
Hallenweg 23
7522 NH Enschede
Netherlands
University of Twente
Carré C1510
P.O. Box 217
7500 AE Enschede
Netherlands
Organisations
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