Prof.dr. Fred Bijkerk has a PhD in Experimental Physics from the University of Amsterdam (1993). His thesis describes the application of short-wavelength light from a laser-generated plasma source to X-ray and Extreme UV lithography. From 2004 to 2014 he was head of the Nanolayer Surface and Interface Physics department at the FOM-Institute for Plasma Physics Rijnhuizen. In 2005 he was appointed as a part-time professor on XUV sources and multilayer optics at the MESA+ Institute for Nanotechnology at the University of Twente.
Bijkerk received the FOM Valorization Prize 2010 for his efforts to engage high-tech industry in his research. In 2012 he initiated the Industrial Focus Group XUV Optics at MESA+, a public-privately funded research initiative on application-inspired thin film systems and XUV optics.
Bijkerk published over 250 journal articles and 35 patents on thin film systems and XUV optics and acted as the supervisor of 42 PhD doctorate candidates. He retired in 2021 to become part-time advisor on scientific and valorization aspects of the group’s research, while Marcelo Ackermann took over his role as a full chair.