prof.dr. F. Bijkerk (Fred) | University of Twente

Prof.dr. Fred Bijkerk has a PhD in Experimental Physics from the University of Amsterdam (1993). His thesis describes the application of short-wavelength light from a laser-generated plasma source to X-ray and Extreme UV lithography. From 2004 to 2014 he was head of the Nanolayer Surface and Interface Physics department at the FOM-Institute for Plasma Physics Rijnhuizen. In 2005 he was appointed as a part-time professor on XUV sources and multilayer optics at the MESA+ Institute for Nanotechnology at the University of Twente.

Bijkerk received the FOM Valorization Prize 2010 for his efforts to engage high-tech industry in his research. In 2012 he initiated the Industrial Focus Group XUV Optics at MESA+, a public-privately funded research initiative on application-inspired thin film systems and XUV optics.

Bijkerk published over 250 journal articles and 35 patents on thin film systems and XUV optics and acted as the supervisor of 42 PhD doctorate candidates. He retired in 2021 to become part-time advisor on scientific and valorization aspects of the group’s research, while Marcelo Ackermann took over his role as a full chair.

Physics & Astronomy

# Lithography
# Mirrors
# Optics
# Reflectance
# Thin Films
# Wavelengths

Engineering & Materials Science

# Multilayers

Chemistry

# Multilayer

Faculty of Science and Technology (TNW), XUV Optics (XUV)

Chen, J. , Louis, E., Harmsen, R. , Tsarfati, T. , Wormeester, H., van Kampen, M., van Schaik, W. , van de Kruijs, R. , & Bijkerk, F. (2022). Corrigendum to “In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers” [Appl. Surf. Sci. 258(1) (2011) 7–12, (S0169433211011883), (10.1016/j.apsusc.2011.07.121)]. Applied surface science, [155765]. https://doi.org/10.1016/j.apsusc.2022.155765

Lucke, P. , Nematollahi, M. , Bayraktar, M. , Yakshin, A. E. , Elshof, J. E. T. , & Bijkerk, F. (2022). Influence of the Template Layer on the Structure and Ferroelectric Properties of PbZr0.52Ti0.48O3 Films. ACS Omega, 7(26), 22210-22220. https://doi.org/10.1021/acsomega.2c00815

Chandrasekaran, A. (2022). Surface and interface diffusion processes in nanoscale thin films. [PhD Thesis - Research UT, graduation UT, University of Twente]. University of Twente. https://doi.org/10.3990/1.9789036554763

Shafikov, A. (2022). Fracture behavior and characterization of free-standing metal silicide thin films. [PhD Thesis - Research UT, graduation UT, University of Twente]. University of Twente. https://doi.org/10.3990/1.9789036554251

Schurink, B. , van den Beld, W. , Tiggelaar, R. M. , van de Kruijs, R. W. E. , & Bijkerk, F. (2022). Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions. Coatings, 12 (5), [685]. https://doi.org/10.3390/coatings12050685

Phadke, P. , Zameshin, A. A. , Sturm, J. M. , van de Kruijs, R. W. E. , & Bijkerk, F. (2022). Sputter yields of monoatomic solids by Ar and Ne ions near the threshold: A Bayesian analysis of the Yamamura Model. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 520, 29-39. https://doi.org/10.1016/j.nimb.2022.03.016

Shafikov, A. , van de Kruijs, R. W. E. , Benschop, J. P. H. , Schurink, B. , van den Beld, W. T. E. , Houweling, Z. S. , Kooi, B. J. , Ahmadi, M., de Graaf, S. , & Bijkerk, F. (2022). Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranes. Intermetallics, 144, [107531]. https://doi.org/10.1016/j.intermet.2022.107531

Kizir, S. (2022). Nucleation, growth and hydrogen resistance of multi-layer graphene. [PhD Thesis - Research UT, graduation UT, University of Twente]. University of Twente. https://doi.org/10.3990/1.9789036552820

Shafikov, A. , van de Kruijs, R. W. E. , Benschop, J. P. H. , van den Beld, W. , Houweling, S. , & Bijkerk, F. (2022). Fracture Toughness of Free-Standing ZrSiₓ Thin Films Measured Using Crack-on-a-Chip Method. Journal of microelectromechanical systems, 31(1), 63-73. https://doi.org/10.1109/JMEMS.2021.3128760

Shavikof, A. , Bijkerk, F. , Schurink, B. , Sturm, J. M. , & van de Kruijs, R. W. E. (2021). PELLICLE FOR EUV LITHOGRAPHY. (Patent No. CN113646697).

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f.bijkerk@utwente.nl

secretariaat-xuv-tnw@utwente.nl

www.utwente.nl/xuv

Visiting Address

University of Twente
Faculty of Science and Technology
Carré (building no. 15), room C2025
Hallenweg 23
7522NH Enschede
The Netherlands

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Mailing Address

University of Twente
Faculty of Science and Technology
Carré C2025
P.O. Box 217
7500 AE Enschede
The Netherlands

Faculty of Science and Technology (TNW), XUV Optics (XUV)

University of Twente Drienerlolaan 5
7522 NB Enschede

+31 (0)53 489 9111
info@utwente.nl
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