prof.dr. F. Bijkerk (Fred)

Physics & Astronomy

# Lithography
# Mirrors
# Optics
# Reflectance
# Thin Films
# Wavelengths

Engineering & Materials Science

# Multilayers

Chemistry

# Multilayer

Faculty of Science and Technology (TNW), XUV Optics (XUV)

Schurink, B. , van den Beld, W. , Tiggelaar, R. M. , van de Kruijs, R. W. E. , & Bijkerk, F. (2022). Synthesis and Characterization of Boron Thin Films Using Chemical and Physical Vapor Depositions. Coatings, 12 (5), [685]. https://doi.org/10.3390/coatings12050685

Shafikov, A. , van de Kruijs, R. W. E. , Benschop, J. P. H. , van den Beld, W. , Houweling, S. , & Bijkerk, F. (2022). Fracture Toughness of Free-Standing ZrSiₓ Thin Films Measured Using Crack-on-a-Chip Method. Journal of microelectromechanical systems, 31(1), 63-73. https://doi.org/10.1109/JMEMS.2021.3128760

Shafikov, A. , van de Kruijs, R. W. E. , Benschop, J. P. H. , Schurink, B. , van den Beld, W. T. E. , Houweling, Z. S. , Kooi, B. J. , Ahmadi, M., de Graaf, S. , & Bijkerk, F. (2022). Relation between composition and fracture strength in off-stoichiometric metal silicide free-standing membranes. Intermetallics, 144, [107531]. https://doi.org/10.1016/j.intermet.2022.107531

Phadke, P. , Zameshin, A. A. , Sturm, J. M. , van de Kruijs, R. W. E. , & Bijkerk, F. (2022). Sputter yields of monoatomic solids by Ar and Ne ions near the threshold: A Bayesian analysis of the Yamamura Model. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 520, 29-39. https://doi.org/10.1016/j.nimb.2022.03.016

Kizir, S. (2022). Nucleation, growth and hydrogen resistance of multi-layer graphene. University of Twente. https://doi.org/10.3990/1.9789036552820

Stilhano Vilas Boas, C. R. , Sturm, J. M. , van den Beld, W. T. E. , & Bijkerk, F. (2021). Oxidation kinetics of transition metals exposed to molecular and atomic oxygen. Materialia, 20, [101203]. https://doi.org/10.1016/j.mtla.2021.101203

Shavikof, A. , Bijkerk, F. , Schurink, B. , Sturm, J. M. , & van de Kruijs, R. W. E. (2021). PELLICLE FOR EUV LITHOGRAPHY. (Patent No. CN113646697).

Lucke, P. , Bayraktar, M. , Schukkink, N. , Yakshin, A. E. , Rijnders, G. , Bijkerk, F. , & Houwman, E. P. (2021). Influence of DC Bias on the Hysteresis, Loss, and Nonlinearity of Epitaxial PbZr_0.55 Ti_0.45 O₃ Films. Advanced electronic materials, 7(8), [2100115]. https://doi.org/10.1002/aelm.202100115

Lucke, P. (2021). Layer Growth And Hysteresis Modelling Of Epitaxial Lead Zirconate Titanate Thin films. University of Twente. https://doi.org/10.3990/1.9789036551526

Akhmetov, F. , Milov, I., Formisano, F., Janssen, S., Semin, S. , Makhotkin, I. A., Kimel, A. , Bijkerk, F. , & Ackermann, M. D. (2021). Photo-induced ultrafast processes leading to degradation of thin films. Poster session presented at Physics@Veldhoven 2021, Online Event, Netherlands.

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+31620573555 (mobile)

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f.bijkerk@utwente.nl

secretariaat-xuv-tnw@utwente.nl

www.utwente.nl/xuv

Visiting Address

University of Twente
Faculty of Science and Technology
Carré (building no. 15), room C2025
Hallenweg 23
7522NH Enschede
The Netherlands

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Mailing Address

University of Twente
Faculty of Science and Technology
Carré C2025
P.O. Box 217
7500 AE Enschede
The Netherlands

Faculty of Science and Technology (TNW), XUV Optics (XUV)

University of Twente Drienerlolaan 5
7522 NB Enschede

+31 (0)53 489 9111
info@utwente.nl
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Full Professor Industrial Focus Group XUV Optics

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Courses Academic Year 2021/2022

Courses Academic Year 2020/2021

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