Niek Lokhorst is a PhD student in the Industrial Focus Group XUV Optics (TNW faculty) with strong affiliations to the group Mathematics of Computational Science (MACS) (EEMCS faculty) at the University of Twente.
His research interests include x-ray metrology and Bayesian inference.
Expertise
Material Science
- Film
- Reflectivity
- Energy-Dispersive X-Ray Spectroscopy
- Thin Film Growth
- Thin Film Structure
- Transmission Electron Microscopy
- X-Ray Diffraction
Physics
- X-Ray Reflectivity
Organisations
Publications
2025
Unveiling the effect of adding B4C at the W-on-Si interface (2025)Surfaces and Interfaces, 72. Article 107471. Valpreda, A., Lokhorst, H. W., Sturm, J. M., Yakshin, A. E. & Ackermann, M.https://doi.org/10.1016/j.surfin.2025.107471
Research profiles
Courses academic year 2025/2026
Courses in the current academic year are added at the moment they are finalised in the Osiris system. Therefore it is possible that the list is not yet complete for the whole academic year.
Courses academic year 2024/2025
Address
University of Twente
Carré (building no. 15), room C2015
Hallenweg 23
7522 NH Enschede
Netherlands
University of Twente
Carré C2015
P.O. Box 217
7500 AE Enschede
Netherlands
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