I studied Applied Physics at Eindhoven University of Technology in the Netherlands, after which I obtained my PhD at the University of Twente in 2006. After 2 years of post-doc at the Fritz Haber Institute of the Max Planck Society in Berlin (Germany), I joined the FOM Institute for Plasma Physics Rijnhuizen in Nieuwegein (the Netherlands). Since 2014, when the current XUV group moved from Nieuwegein to the University of Twente, I have been senior staff member in the XUV group.

Throughout my career I developed a strong background in surface analysis, thin film fabrication and surface chemistry studies.

Expertise

  • Chemistry

    • Surface
    • Liquid Film
    • Energy
    • Ion
    • Scattering
  • Material Science

    • Thin Films
    • Material
  • Physics

    • Ion Scattering

Organisations

My research focuses on the application of surface analysis techniques to (i) study thin film growth, with a focus on XUV optics applications and (ii) study interaction of plasma, ions and radicals with thin film surfaces.

Publications

2024
2023
Interface smoothing in short-period W/B4C multilayers using neon ion beam polishingJournal of Applied Physics, 134(24), Article 245303. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0175793Role of Excess Bi on the Properties and Performance of BiFeO3 Thin-Film PhotocathodesACS Applied Energy Materials, 6(24), 12237−12248. Prasad, N. P., Rohnke, M., Verheijen, M. A., Sturm, J. M., Hofmann, J. P., Hensen, E. J. M. & Bieberle-Hütter, A.https://doi.org/10.1021/acsaem.3c01926Growth and optical performance of short-period W/Al and polished W/Si/Al/Si multilayersJournal of Applied Physics, 134(15), Article 155301. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0168377Infrared emissivity of thin films based on molybdenum silicides with silicon. Baskakov, A., Golsanamlou, Z., van de Kruijs, R. W. E., Bokdam, M., Sturm, J. M. & Ackermann, M.Chemical Interaction of Hydrogen Radicals (H*) with Transition Metal NitridesThe Journal of physical chemistry C, 127(36), 17770-17780. Rehman, A., Kruijs, R. W. E. v. d., Beld, W. T. E. v. d., Sturm, J. M. & Ackermann, M.https://doi.org/10.1021/acs.jpcc.3c04490Resolving buried interfaces with low energy ion scatteringJournal of vacuum science & technology A: vacuum, surfaces, and films, 41(4), Article 043203. Valpreda, A., Sturm, J. M., Yakshin, A. E. & Ackermann, M.https://doi.org/10.1116/6.0002567Implementing 0.1 nm B4C barriers in ultrashort period 1.0 nm W/Si multilayers for increased soft x-ray reflectanceJournal of Applied Physics, 133(24), Article 245301. IJpes, D., Yakshin, A., Sturm, J. M. & Ackermann, M.https://doi.org/10.1063/5.0153322Laser-induced electron dynamics and surface modification in ruthenium thin filmsVacuum, 212, Article 112045. Akhmetov, F., Milov, I., Semin, S., Formisano, F., Medvedev, N., Sturm, J. M., Zhakhovsky, V. V., Makhotkin, I. A., Kimel, A. & Ackermann, M.https://doi.org/10.1016/j.vacuum.2023.112045

Research profiles

I am involved in following courses:

Optics practical of module 6 (BSc Applied Physics)

Surfaces and Thin Layers (MSc Applied Physics)

Nanolab practical (MSc Nanotechnology)

In our research group we usually have thesis assignments availableĀ for BSc and MSc students Applied Physics and MSc studentsĀ Nanotechnology.

Affiliated study programs

Courses academic year 2023/2024

Courses in the current academic year are added at the moment they are finalised in the Osiris system. Therefore it is possible that the list is not yet complete for the whole academic year.

Courses academic year 2022/2023

Address

University of Twente

Carré (building no. 15), room C2019
Hallenweg 23
7522 NH Enschede
Netherlands

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Organisations

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