Expertise

  • Material Science

    • Boron
    • Chemical Vapor Deposition
    • Physical Vapor Deposition
    • Silicon
    • Nucleation
  • Engineering

    • Vapor Deposition
    • Flow Sensor
    • Vapor Deposition Method

Organisations

Publications

2026

Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System (2026)Journal of the Electron Devices Society, 14, 176-185. Vu, T. T. H., Batenburg, K. M., Aarnink, A. A. I., Wu, W., Kovalgin, A. Y., Gravesteijn, D. J. & Hueting, R. J. E.https://doi.org/10.1109/JEDS.2026.3667184

2023

Batch furnace CVD of pure boron layers on Si and GaN substrates for lowleakage- current diode fabrication (2023)JST: Engineering and Technology for Sustainable Development, 33(2), 29-35. Vu, T. T. H., Batenburg, K. M., Aarnink, A. A. I., Knežević, T., Liu, X. & Nanver, L. K.https://doi.org/10.51316/jst.165.etsd.2023.33.2.5

2022

A miniature microclimate thermal flow sensor for horticultural applications (2022)In 2022 IEEE Sensors. Article 9967348. IEEE. Alveringh, D., Bijsterveld, D. G., Berg, T. E. v. d., Veltkamp, H.-W., Batenburg, K. M., Sanders, R. G. P., Lötters, J. C. & Wiegerink, R. J.https://doi.org/10.1109/SENSORS52175.2022.9967348Miniature robust high-bandwidth force sensor with mechanically amplified piezoresistive readout (2022)In 2022 IEEE 35th International Conference on Micro Electro Mechanical Systems Conference (MEMS) (pp. 684-687). IEEE. Alveringh, D., van der Ven, D. L., Veltkamp, H.-W., Batenburg, K. M., Sanders, R. G. P., Fernandez Rivas, D. & Wiegerink, R. J.https://doi.org/10.1109/MEMS51670.2022.9699639

Research profiles

Address

University of Twente

Carré (building no. 15), room C2615
Hallenweg 23
7522 NH Enschede
Netherlands

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Organisations

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