Expertise
Material Science
- Film Thickness
- Molybdenum
- Tungsten
- Temperature
- Electrical Resistivity
- Film
Engineering
- Thickness
- Test Structure
Organisations
Publications
2024
Electrical behavior of ALD-molybdenum films in the thin-film limitIn 2024 IEEE 36th International Conference on Microelectronic Test Structures, ICMTS 2024 - Proceedings. IEEE. Van Der Zouw, K., Dulfer, S. D., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1109/ICMTS59902.2024.10520676
2023
Low-resistivity molybdenum obtained by atomic layer deposition, Article 052402. van der Zouw, K., van der Wel, B. Y., Aarnink, A. A. I., Wolters, R. A. M., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0002804Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride, 17134-17145. van der Wel, B. Y., van der Zouw, K., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.3c03063
2020
Conduction and electric field effect in ultra-thin tungsten films, Article 9016070, 202-209. van der Zouw, K., Aarnink, A. A. I., Schmitz, J. & Kovalgin, A. Y.https://doi.org/10.1109/TSM.2020.2976886
Research profiles
Address
University of Twente
Nanolab (building no. 16), room 1003
Hallenweg 23
7522 NH Enschede
Netherlands
University of Twente
Nanolab 1003
P.O. Box 217
7500 AE Enschede
Netherlands
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