K. van der Zouw MSc | People Pages: Find employees & contact details | University of Twente

Expertise

Material Science
- Film
- Molybdenum
- Aluminum Nitride
- Film Thickness
- Tungsten
- Electrical Resistivity
- Thin Films
Engineering
- Test Structure

Organisations

Publications

2025

Chemisorption of H radical generated volatile Si hydrides on Ru films (2025)Surfaces and Interfaces, 78. Article 107956. Gaffarov, I., van der Zouw, K., Aarnink, T., Sturm, J. M., Makhotkin, I. A. & Ackermann, M.https://doi.org/10.1016/j.surfin.2025.107956Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride (2025)ACS Omega, 10(45), 53874-53886. van der Wel, B. Y., van der Zouw, K., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1021/acsomega.5c03453Metallic molybdenum obtained by atomic layer deposition from Mo(CO)₆ (2025)Journal of vacuum science & technology A: vacuum, surfaces, and films, 43(2). Article 022407. van der Zouw, K., van der Wel, B. Y., Sturm, J. M., Aarnink, A. A. I., Wolters, R. A. M., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0004244

2024

Electrical behavior of ALD-molybdenum films in the thin-film limit (2024)In 2024 IEEE 36th International Conference on Microelectronic Test Structures, ICMTS 2024 - Proceedings (IEEE International Conference on Microelectronic Test Structures). IEEE. Van Der Zouw, K., Dulfer, S. D., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1109/ICMTS59902.2024.105206763D self-aligned nano junctions in silicon fractals (2024)[Contribution to conference › Poster] MESA+ Meeting 2024. Steenge, C., Dawood, F., van der Zouw, K., Kooijman, L. J., Berenschot, E. J. W., Hueting, R. J. E. & Tas, N. R.

2023

Low-resistivity molybdenum obtained by atomic layer deposition (2023)Journal of vacuum science & technology A: vacuum, surfaces, and films, 41(5). Article 052402. van der Zouw, K., van der Wel, B. Y., Aarnink, A. A. I., Wolters, R. A. M., Gravesteijn, D. J. & Kovalgin, A. Y.https://doi.org/10.1116/6.0002804Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Aluminum Nitride (2023)The Journal of physical chemistry C, 127(34), 17134-17145. van der Wel, B. Y., van der Zouw, K., Aarnink, A. A. I. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.3c03063

Research profiles

Address

University of Twente

Nanolab (building no. 16), room 1003
Hallenweg 23
7522 NH Enschede
Netherlands

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Organisations