Carré

dr.ir. R.W.E. van de Kruijs (Robbert)

Assistant Professor
TNW-NEM-XUV
Carré C2017
r.w.e.vandekruijs@utwente.nl
+31534894415
Business card

Expertise

  • Material Science

    • Thin Films
    • Film
    • Reflectivity
    • Hydrogen
    • Laminate
    • Annealing
    • Lithography

  • Physics

    • Reflectance

Organisations

Publications

2026

Hydrogen Radical Permeation Dynamics through Ultrathin ALD Al2O3 Layers Revealed by In Situ Ellipsometry (2026)The Journal of physical chemistry C, 130(23), 8035-8045. Wu, W., van de Kruijs, R. W. E., Gravesteijn, D. J., Houweling, Z. S., Colombi, G. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.6c00522Chemical etch resistance of sputter-deposited metal oxide thin film coatings in atomic hydrogen at 700 °C (2026)Materials chemistry and physics, 354. Article 132143. Pushkarev, R., Houweling, Z. S., van de Kruijs, R. W. E., Van den Beld, W. T. E., Sturm, J. M., Ackermann, M. D. & Bijkerk, F.https://doi.org/10.1016/j.matchemphys.2026.132143Thickness dependence of infrared optical properties of ultrathin MoSi2-based thin films (2026)Thin solid films, 837. Article 140890. Baskakov, A., van de Kruijs, R., van den Beld, W. T. E., Houweling, Z. S., Colombi, G. & Ackermann, M.https://doi.org/10.1016/j.tsf.2026.140890Sensing of Hydrogen Diffusion through Protective Caps: An Ellipsometric Approach to Estimate Hydrogen Content in Pd/Hf Stacks with an Al2O3Cap (2026)The Journal of physical chemistry C, 130(7), 2591-2604. Wu, W., van de Kruijs, R. W. E., Gravesteijn, D. J., Houweling, Z. S., Colombi, G. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.5c06383Using Monte Carlo-based Uncertainty Quantification for Free-Form XRR (2026)[Contribution to conference › Poster] NWO Physics 2026. Lokhorst, H. W., van de Kruijs, R. W. E., Makhotkin, I. A., Schlottbom, M. & Ackermann, M.

2025

Hume-Rothery driven oxidation resilience of binary alloy thin films (2025)Journal of Applied Physics, 138(23). Article 235301. Homsma, M. D., Van den Beld, W. T. E., Van de Kruijs, R. W. E. & Ackermann, M. D.https://doi.org/10.1063/5.0293334EUV spectrum of high power LPP source (2025)In International Conference on Extreme Ultraviolet Lithography 2025. Article 1368611 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13686). SPIE. van de Kerkhof, M., van der Horst, R., Bayraktar, M., van de Kruijs, R., Osorio, E. & Ackermann, M.https://doi.org/10.1117/12.3072173Using Monte Carlo-based Uncertainty Quantification for Free-Form XRR (2025)[Contribution to conference › Poster] 8th PTB-Seminar on VUV and EUV Metrology 2025. Lokhorst, H. W., van de Kruijs, R. W. E., Makhotkin, I. A., Schlottbom, M. & Ackermann, M.Film thickness non-uniformity and crucial role of water dosage for atomic layer deposition of yttrium oxide from yttrium cyclopentadienyl precursor (2025)[Contribution to conference › Poster] 24th EUROCVD & ALD 2025. Wu, W., van de Kruijs, R. W. E. & Kovalgin, A. Y.Using Monte Carlo-based methods for Uncertainty Quantification for XRR (2025)[Contribution to conference › Poster] International Workshop on X-Ray and Neutron Multilayer Structures, PXRNMS 2025. Lokhorst, H. W., van de Kruijs, R. W. E., Makhotkin, I. A., Schlottbom, M. & Ackermann, M.

Research profiles

Courses academic year 2026/2027

Courses in the current academic year are added at the moment they are finalised in the Osiris system. Therefore it is possible that the list is not yet complete for the whole academic year.

Courses academic year 2025/2026

Courses academic year 2024/2025

Address

University of Twente

Carré (building no. 15), room C2017
Hallenweg 23
7522 NH Enschede
Netherlands

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