Expertise
Engineering & Materials Science
# Aspect Ratio
# Lithography
# Masks
# Plasma Etching
Physics & Astronomy
# High Aspect Ratio
# Lithography
# Plasma Etching
Chemistry
# Etching
Organisations
Publications
Recent
Ni, S.
, Berenschot, E. J. W.
, Westerik, P. J.
, de Boer, M. J.
, Wolf, R.
, Le-The, H.
, Gardeniers, H. J. G. E.
, & Tas, N. R. (2020).
Wafer-scale 3D shaping of high aspect ratio structures by multistep plasma etching and corner lithography.
Microsystems and Nanoengineering,
6(1), Article 25.
https://doi.org/10.1038/s41378-020-0134-6
UT Research Information System
Contact Details
Visiting Address
University of Twente
Faculty of Electrical Engineering, Mathematics and Computer Science
Nanolab
(building no. 16), room 1011
Hallenweg 23
7522NH Enschede
The Netherlands
Mailing Address
University of Twente
Faculty of Electrical Engineering, Mathematics and Computer Science
Nanolab
1011
P.O. Box 217
7500 AE Enschede
The Netherlands