W. Wu (Weihua)

Researcher
TNW-ANP-IOS
w.wu@utwente.nl
Business card

Main research focus: ALD-based thin films for XUV optics

2021-now, University of Twente, PhD candidate in project "X-tools"

Combined project from IDS (EEMCS) and XUV (TNW) group, under supervision of dr. Alexey Y. Kovalgin (IDS), dr. Robbert W. E. van de Kruijs (XUV), and prof. dr. Jurriaan Schmitz (IDS)

2018-2021, TCL CSOT, Process engineer in oxide-based thin film transistors.

2015-2018, Shanghai University and Ningbo Institute of Materials Technology & Engineering, Master degree on materials science.

2011-2015, Nanjing University of Science and Technology, Bachelor degree on polymer science and engineering.

Expertise

  • Material Science

    • Film Thickness
    • Hydrogen
    • Yttrium Oxide
    • Yttrium
    • Aluminum Oxide
    • Chemical Vapor Deposition
    • Film
    • Silicon

Organisations

Publications

2026

Film Thickness Nonuniformity and the Crucial Role of Water Dosage for Atomic Layer Deposition of Yttrium Oxide (2026)Physica status solidi A, 223(16). Article e70456 (E-pub ahead of print/First online). Wu, W., van de Kruijs, R. W. E., Gravesteijn, D. J., Houweling, Z. S., Colombi, G. & Kovalgin, A. Y.https://doi.org/10.1002/pssa.70456Hydrogen Radical Permeation Dynamics through Ultrathin ALD Al2O3 Layers Revealed by In Situ Ellipsometry (2026)The Journal of physical chemistry C, 130(23), 8035-8045. Wu, W., van de Kruijs, R. W. E., Gravesteijn, D. J., Houweling, Z. S., Colombi, G. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.6c00522Sensing of Hydrogen Diffusion through Protective Caps: An Ellipsometric Approach to Estimate Hydrogen Content in Pd/Hf Stacks with an Al2O3Cap (2026)The Journal of physical chemistry C, 130(7), 2591-2604. Wu, W., van de Kruijs, R. W. E., Gravesteijn, D. J., Houweling, Z. S., Colombi, G. & Kovalgin, A. Y.https://doi.org/10.1021/acs.jpcc.5c06383Realization of Pure Boron/Si Diodes Through a Two-Step Low-Temperature Growth in a Home-Built LP CVD System (2026)Journal of the Electron Devices Society, 14, 176-185. Vu, T. T. H., Batenburg, K. M., Aarnink, A. A. I., Wu, W., Kovalgin, A. Y., Gravesteijn, D. J. & Hueting, R. J. E.https://doi.org/10.1109/JEDS.2026.3667184

2025

Film thickness non-uniformity and crucial role of water dosage for atomic layer deposition of yttrium oxide from yttrium cyclopentadienyl precursor (2025)[Contribution to conference › Poster] 24th EUROCVD & ALD 2025. Wu, W., van de Kruijs, R. W. E. & Kovalgin, A. Y.

Research profiles

X-tools project aims to gain the knowledge on solving practical problems from present XUV machines and provide deeper understanding on how to apply it from multidisciplinary view of point. My work is focused on exploring oxide-based candidates by ALD as promising ultra-thin films to survive XUV condition.  

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