Yorick currently works as an NWO RUBICON Postdoctoral Research Fellow in the Oxide Molecular Beam Epitaxy Group of Prof. Darrell Schlom at Cornell University in the United States.
He previously worked in the Inorganic Materials Science (IMS) group at the University of Twente under supervision of Prof. Guus Rijnders. His focus is on the fabrication and characterization of thin films with atomic precision.
Dr. Yorick A. Birkhölzer works on new materials and devices for sustainable electronics. He obtained his PhD (cum laude) in 2022 on nanoscale strain control of oxide thin films in the Inorganic Materials Science group chaired by prof. dr. ing. Guus Rijnders
Yorick's expertise lies in the fabrication of crystalline thin films by pulsed laser deposition and molecular-beam epitaxy, and characterization by scanning probe microscopy and X-ray diffraction and spectroscopy.
His research interests lie in the physics of complex oxides, in particular perovskite ferroelectrics and Mott insulators such as vanadium dioxide that display a metal-insulator transition.
Yorick actively collaborates with various groups, nationally and abroad, on operando measurements, performing cutting edge X-ray science while applying electric fields or heat in situ to micodevices such as piezo- and ferroelectrics, thin film transistors, supercapacitors, microbatteries, catalysts, and solar cells.
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Yorick Birkhölzer obtained his PhD cum laude at the University of Twente (2022). Prior to that, he graduated from the MSc program Nanotechnology (2018) and BSc program Advanced Technology (2015, both also cum laude).
During his studies, he worked as visiting research student at Stanford University, USA, and KAUST, Saudi Arabia.
Yorick currently works at Cornell University, USA, as NWO RUBICON Postdoctoral Researcher.